Poster Session 1

| P1 | Power-Delay Product in COSMOS Logic Circuits

A. Al-Ahmadi and S. Kaya

Ohio University, USA |

| P2 | A 3D Finite Element Parallel Simulator for Studying Fluctuations in Advanced MOSFETs

M. Aldegunde, A. Garcia-Loureiro, K. Kalna1, and A. Asenov1

University of Santiago de Compostela, Spain

1University of Glasgow, United Kingdom |

| P3 | Calibration of the Density-Gradient Model by Using the Multidimensional Effective-mass Schrödinger Equation

P. Andrei

Florida State University and Florida AM University, USA|

| P4 | Random Dopant Fluctuation Analysis for Scaling Multi-Gate Device Structures

Y. Ashizawa, R. Tanabe, and H. Oka

Fujitsu Laboratories, Japan |

| P5 | Study of Piezoresistivity Effect in FET

M. Auf der Maur, M. Povolotskyi, F. Sacconi, and A. Di Carlo

University of Rome Tor Vergata, Italy |

| P6 | Influences of Grain Structure on Thermally Induced Stresses in 3D-IC Inter-wafer Vias

D. Bentz, M. Bloomfield, J.-Q Lu, R. Gutmann, and T. Cale

Rensselaer Polytechnic Institute, USA |

| P7 | TCAD-Assisted Development of Technology-Independent Device Models

P. Blakey, S. Bates, and U. Yahya

Northern Arizona University, USA |

| P8 | Intrinsic Parameter Fluctuations due to Random Grain Orientations in High-k Gate Stacks

A. Brown, J. Watling, and A. Asenov

University of Glasgow, United Kingdom |

| P9 | Gummel Iterations for Inverse Dopant Profiling of Semiconductor Devices

M. Burger

Johannes Kepler University, Austria |

| P10 | An Evolution Algorithm for Noise Modeling of HEMT's down to Cryogenic Temperatures

A. Caddemi, F. Catalfamo, and N. Donato

University of Messina, Italy |

| P11 | Combined Line-Width-Roughness (LWR) and Local Critical Dimension (CD) Variation Effects on Sub-65nm MOSFET Current-Voltage Characteristics: From Lithography to Metrology to Device Simulation

V. Constantoudis, G. Patsis, and E. Gogolides

NCSR Demokritos, Greece |

| P12 | TCAD Simulation of OTFT Small-Signal Parameters

C. Erlen, P. Lugli, B. Nickel1, and M. Fiebig1

TU Munich, Germany

1LMU Munich, Germany |

| P13 | Semiconductor Transport Modeling for the Analysis of Nanoscaled CMOS Circuits

F. Felgenhauer, M. Begoin, J. Bremer, and W. Mathis

University of Hannover, Germany |

| P14 | A Novel Framework for Distributing Computations

T. Fühner, S. Popp1, and T. Jung

Fraunhofer IISB, Germany

1University of Applied Science Regensburg, Germany |

| P15 | Efficient Full-Flow Process Simulation for 3D Structures including Stress Modeling

A. Gencer, A. Lebedev1, and P. Pfäffli1

Synopsys, Germany

1Synopsys, Switzerland |

| P16 | Simulation of Slow Current Transients and Current Compression in AlGaAs/GaAs HFETs

H. Ikarashi, K. Kitamura, N. Kurosawa, and K. Horio

Shibaura Institute of Technology, Japan |

| P17 | Compact Model for Schottky-barrier CNT-FETs

D. Jimenez, X. Cartoixa, E. Miranda, J. Sune, and S. Roche1

Universitat Autonoma de Barcelona, Spain

1Commisariat a l' Energie Atomique, France |

| P18 | A Simulation-Based Evolutionary Technique for Inverse Problems of Sub-65nm CMOS Devices

Y. Li, S.-M. Yu, and C.-K. Chen

National Chiao Tung University, Taiwan |

| P19 | Numerical Simulation of Electrical Characteristics on Uniaxial Strained Bulk and SOI FinFETs

Y. Li and W.-H. Chen

National Chiao Tung University, Taiwan |

| P20 | Strain Engineering with Si1-yCy Source and Drain Stressors

C. Maiti and A. Saha

IIT Kharagpur, India |

| P21 | Hot Electron Distribution Function for the Boltzmann Equation with Analytic Bands

O. Muscato

University of Catania, Italy |

| P22 | Computer Simulation Experiment on Prospects of ZnS as Novel Material for High mm-Wave Power/Low Noise Generation in Impatt Mode

S. Pati and P. Tripathy

Sambalpur University, India |

| P23 | Accurate Extraction of Maximum Current Densities from the Layout

A. Seidl, T. Schnattinger1, A. Erdmann1, H. Hartmann2, and A. Petrashenko2

Hochschule Magdeburg-Stendal, Germany

1Fraunhofer IISB, Germany

2Software and System Solutions GbR, Germany |

| P24 | A 3D Parallel Simulation of the Effect of Interface Charge Fluctuations in HEMTs

N. Seoane, A. Garcia-Loureiro, K. Kalna1, and A. Asenov1

University of Santiago de Compostela, Spain

1University of Glasgow, United Kingdom |

| P25 | Negative Gate-Overlap in Nanoscaled DG-MOSFETs with Asymmetric Gate Bias

X. Shao and Z. Yu

Tsinghua University, China |

| P26 | Human Body Model ESD Simulation Including Self Heating Effect

T. Takani and T. Toyabe

Toyo University, Japan |

| P27 | Quantum Correction for DG MOSFETs

M. Wagner, M. Karner, T. Grasser, and H. Kosina

TU Vienna, Austria |

| P28 | Weak Accumulation of Gate Polysilicon

H. Watanabe, K. Matsuo, T. Kobayashi, K. Nakajima, and T. Saitoh

Toshiba Corporation, Japan |

| P29 | Numerical Analysis of a DAR IMPATT Diode

A. Zemliak and S. Cabrera

Puebla Autonomous University, Mexico |

| P30 | Meshless Solution of the 3-D Semiconductor Poisson Equation

Z. Aksamija and U. Ravaioli

University of Illinois at Urbana, USA |

| P31 | Particle-based Simulations of Phonon Transport in Silicon

A. Asokan and R. Kelsall

University of Leeds, United Kingdom |

| P32 | Neutral and Negatively Charged Interstitial Oxygen in Silicon

P. Ballo, D. Donoval, and L. Harmatha

Slovak University of Technology, Slovakia |

| P33 | Model Plasma Dispersion Functions for SO Phonon Scattering in Monte Carlo Simulations of High-k Dielectric MOSFETS

J. Barker and J. Watling

University of Glasgow, United Kingdom |

| P34 | On a Simple and Accurate Quantum Correction for Monte Carlo Simulation

F. Bufler1, R. Hude, and A. Erlebach

ETHZ Integrated Systems Laboratory, Switzerland

1Synopsys Schweiz GmbH, Switzerland |

| P35 | DSMC versus WENO-BTE: A Double Gate MOSFET Example

M. Caceres, J. Carrillo1, I. Gamba2, A. Majorana3, and C.-W. Shu4

Universidad de Granada, Spain

1Universitat Autonoma de Barcelona, Italy

2University of Texas at Austin, USA

3University of Catania, Italy

4Brown University, USA |

| P36 | Electronic Noise in Semiconductor Systems: A Monte Carlo Simulation under Mixed Fields

M. Capizzo, D. Persano Adorno, and M. Zarcone

University of Palermo, Italy |

| P37 | Thermal Noise in Nanometric DG-MOSFET

P. Dollfus, A. Bournel, and J. Velazquez1

Universite Paris-Sud, France

1Universidad de Salamanca, Spain |

| P38 | Full-band Particle-based Simulation of 85 nm AlInSb/InSb Quantum Well Transistors

N. Faralli, J. Branlard, S. Goodnick1, D. Ferry1, and M. Saraniti

Illinois Institute of Technology, USA

1Arizona State University, USA |

| P39 | On the Impact of High-k Gate Stacks on Mobility: A Monte Carlo Study Including Coupled SO Phonon-plasmon Scattering

G. Ferrari, J. Watling, S. Roy, J. Barker, P. Zeitoff1, G. Bersuker1, and A. Asenov

University of Glasgow, United Kingdom

1SEMATECH, USA |

| P40 | Electron Injection Model for the Particle-simulation of 3D, 2D and 1D Nanoscale FET

E. Fernandez-Diaz and X. Oriols

Universitat Autonoma de Barcelona, Spain |

| P41 | Free-carrier Grating due to the Optical Phonon Emission in InP n+nn+ Structures

V. Gruzinskis, E. Starikov, and P. Shiktorov

Semiconductor Physics Institite, Lithuania |

| P42 | 3D Monte-Carlo Device Simulations Using an Effective Quantum Potential Including Electron-Electron Interactions

C. Heitzinger, C. Ringhofer, S. Ahmed, and D. Vasileska

Arizona State University, USA |

| P43 | Pearson versus Gaussian Effective Potentials for Quantum Corrected Monte-Carlo Simulation

M. Jaud1,2,3, S. Barraud1, P. Dollfus3, H. Jaouen2, and G. Le Carval1

1CEA-LETI, France

2STMicroelectronics, France

3CNRS-UPS, France |

| P44 | Atomistic Modeling for Boron Up-hill Diffusion After Ge Pre-amorphization

J.-S. Kim and T. Won

Inha University, Korea |

| P45 | Threshold Energy and Impact Ionization Scattering Rate Calculations for Strained Silicon

C. May1,2 and F. Bufler2,3

1ETH Zürich, Switzerland

2University of Tuebingen, Germany

3Synopsys Schweiz GmbH, Switzerland |

| P46 | Monte Carlo Calculation of Voltage-Current Nonlinearity and High-Order Harmonic Generation in GaAs Microstructures

D. Persano Adorno, M. Capizzo, and M. Zarcone

University of Palermo, Italy |

| P47 | Static-Electric-Field Effects on Harmonic Generation in Gallium Arsenide Bulk Exposed to Intense Sub-THz Radiation

D. Persano Adorno, M. Zarcone, and G. Ferrante

University of Palermo, Italy |

| P48 | Transport in Silicon Nanowires: Surface Roughness and Confined Phonons

E. Ramayya, D.Vasileska1, S. Goodnick1, and I. Knezevic

University of Wisconsin at Madison, USA

1Arizona State University, USA |

| P49 | Electrothermal Monte Carlo Simulation of Submicron Wurtzite GaN/AlGaN HEMTs

T. Sadi, R. Kelsall, and N. Pilgrim1

University of Leeds, United Kingdom

1University of Aberdeen, United Kingdom |

| P50 | Quantum Ensemble Monte Carlo Simulation of Silicon-based Nanodevices

C. Sampedro, F. Gamiz, A. Godoy, and F. Jimenez-Molinoz

Universidad de Granada, Spain |

| P51 | Monte Carlo Simulation of 2D TASER

E. Starikov, P. Shiktorov, V. Gruzinskis, A. Dubinov1, V. Aleshkin1, L. Varani2, C. Palermo2, and L. Reggiani3

Semiconductor Physics Institute, Lithuania

1Institute for Physics of Microstructures, Russia

2CEM2, France

3INFM-National Nanotechnology Laboratory, Italy |

| P52 | Analysis of Nano-Scale MOSFET Including Uniaxial and Biaxial Strain

R. Tanabe, T. Yamasaki, Y. Ashizawa, and H. Oka

Fujitsu Laboratories, Japan |

| P53 | Study of the Cutoff Frequency of Optimized SOI MESFETs

K. Tarik, D. Vasileska, and T. Thornton

Arizona State University, USA |

| P54 | Physical Modeling of Electron Mobility Enhancement for Arbitrarily Strained Silicon

E. Ungersböck, S. Dhar, G. Karlowatz, H. Kosina, and S. Selberherr

TU Vienna, Austria |

| P55 | Simulation of Tri-Gate MOSFET Using 3D Monte Carlo Method Based on the Quantum Boltzmann Equation

J. Wang, Z. Xia, G. Du, X. Liu, and R. Han

Peking University, China |

| P56 | Electron Transport in Self-Switching Nano-Diode

K.-Y. Xu, A.-M Song1, and G. Wang

Sun Yat-sen University, China

1University of Manchester, United Kingdom |

| P57 | Molecular Dynamic Simulation on Boron Cluster Implantation for Shallow Junction Formation

L. Yuan, W. Li, M. Yu, H. Ji, K. Zhan, R. Huang, X. Zhang, Y. Wang, J. Zhang1, and H. Oka2

Peking University, China

1Fujitsu RD Center, China

2Fujitsu Laboratories, Japan |

| P58 | Physical Modeling of Hole Mobility in Silicon Inversion Layers under Uniaxial Stress

J. Zhao, J. Zou, and Z. Yu

Tsinghua University, China |

| P59 | Reduced Backscattering in Potassium Doped Nanotubes

C. Adessi, S. Roche1,2, and X. Blase

Universite Claude Bernard Lyon, France

1CEA-DSM, France

2CEA-DRT, France |

| P60 | Scaling Of Molecular Electronics Devices

A. Boudjella1,2,3 and K. Mokhtar4

1Queen's College, Canada

2Alpha Toronto, Canada

3Conseil Scolaire de District du centre-Sud-ouest, Canada

4Honeywell-Engines, Canada |

| P61 | Computation of the I-V Characteristics of a Molecular Switch

I. Cacelli1, A. Ferretti2, M. Girlanda1,2, and M. Macucci1

1University of Pisa, Italy

2CNR, Italy |

| P62 | Simulations of Correlated Electronic Transport Across Molecular Junctions

G. Fagas, P. Delaney1, and J. Greer

Tyndall National Institute, Ireland

1Queen's University Belfast, Ireland |

| P63 | Numerical Simulation of Organic Field-Effect-Transistors

W. Klix, R. Stenzel, T. Herrmann, and E. Mehler

University of Applied Sciences Dresden, Germany |

| P64 | Percolation Current in Organic Semiconductors

L. Li, G. Meller, and H. Kosina

TU Vienna, Austria |

| P65 | Ferromagnetism in Tetrahedrally Coordinated Compounds of I/II-V Elements: Ab Initio Calculations

M. Sieberer, J. Redinger, S. Khmelevskyi, and P. Mohn

TU Vienna, Austria |

| P66 | Ab-initio Calculations for Indium Migration in Silicon Substrate

K.-S. Yoon, C.-O. Hwang1, and T. Won

Inha University, Korea

1Soongsil University, Korea |

| P67 | Electrostatic Modeling of Ion Motive Sodium Pump

J. Fonseca, R. Rakowski, and S. Kaya

Ohio University, USA |

| P68 | Numerical Aspects of the Three-Dimensional Feature-Scale Simulation of Silicon-Nanowire Field-Effect Sensors for DNA Detection

C. Heitzinger and G. Klimeck

Purdue University, USA |

| P69 | Shot Noise in Single Open Ion Channels: A Computational Approach Based on Atomistic Simulations

E. Piccinini, R. Brunetti, F. Affinito, C. Jacoboni, and M. Rudan1

University of Modena, Italy

1University